Mass Production Atomic Layer Deposition System

Mass Production Atomic Layer Deposition System, MPALD

Features：

1 SUS316 stainless deposition chamber, dual heater design for substrate;

2 Lid integrated with plasma enhanced modular;

3 high speed ALD diaphragm valves;

4 Customized substrate size;

5 Substrate heating up to 400℃;

6 Up to 6 precursors and 6 gas lines;

7 Metal sealed pipes, heatable up to 120℃;

8 Heating and Cooling for precursor tanks;

9 Fully automatic process control, manually compatible;

10 Mass production.