Manual Deposition System

Manual deposition system is designed for the basic scientific research, student training, electrode preparation, new film development. Easy to use, low cost, small footprint, fast preparation.

Feartures：

1 Base Pressure：10^-7 Torr;

2 Single wafer up to 6 inch;

3 Substrate rotation up to 20 rpm;

4 Substrate heating：300℃/500℃/800℃;

5 Sputtering design：up to 3 magnetron sputtering guns;

6 E-beam Evaporation：up to 6 crucibles, 15cc per crucible;

7 Thermal Evaporation：up to 6 Thermal Evaporation source, including Organic evaporation source;

8 Glove Box compatible;