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chemical vapor deposition

  • Low Pressure Chemical Vapor Deposition System
Low Pressure Chemical Vapor Deposition System

Low Pressure Chemical Vapor Deposition System

  • LPCVD Process
  • Diffusion
  • Annealing
  • Oxidation
  • Product description: LPCVD/Furnace
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LPCVD/Furnace


Specifications:

1 Sample: up to 10 inch

2 Temperature: up to 1700


3 Gas Line: up to 6

4 Oil or Dry pump, Molecular pump option

5 Vertical or Horizontal configuration

6 R&D or Mass Production