EMG-4210 / EGPS-4210型电子枪产品介绍
Focusable, High Energy Electron Beams, Small Spot Size to 100 μm
1 keV to 30 keV
Applications:
Features / Options:
Energy Range: 1 keV to 30 keV
Beam Current: 10 µA to 5 mA*
Spot Size: 100 µm to 10 mm
Mounting: 2.75″ (2¾) CF
*Higher current options available.
The EMG-4210 Electron Gun with matching EGPS-4210 Power Supply is a complete subsystem ready to attach to the user’s vacuum system. It can deliver electrons over a broad range of energies, currents and power with working distances from 50 mm to 1000 mm. The magnetic centering and optional shaping coils provide additional beam control, allowing the user to deflect and shape the electron beam. Applications include space materials testing, radiation studies, semiconductor research, x-ray generation and plasma excitation.
The electron gun system uses a single-crystal lanthanum hexaboride (LaB6) cathode to generate a high energy, focusable, small spot electron beam. Both beam energy and beam current are independently adjustable over wide ranges, with the energy from 1 keV to 30 keV and the current from 10 μA to 5 mA. The electron beam can be pulsed by an input signal to the control grid.
The adjustable optics of the gun can adapt to different divergences and a range of working distances, suitable to a variety of applications. The magnetic focusing lens can vary the spot size from 10 mm down to 100 μm. The magnetic centering and optional shaping coils provide additional beam control, allowing the user to deflect and shape the electron beam. Shaping typically results in an elliptical beam, where both axes of which can be independently compressed or extended. In addition, the cathode to anode spacing is internally adjustable to change perveance.
The gun features an adjustable cathode feedthrough assembly that allows the mechanical alignment of the firing unit with respect to the anode and the column. This alignment can be done in real time while the gun is operating with the beam on.
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